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RT Book, Whole SR Print DC OPAC T1 EUV sources for lithography / Vivek Bakshi A1 Bakshi, Vivek YR 2005 FD 2005 SP xxxv, 1057 p. K1 Ultraviolet radiation -- Industrial applications K1 Plasma (Ionized gases) K1 Lithography PB SPIE Press PP Bellingham, Wash. SN 0819458457 LA English (英語) CL LCC:QC459 CL DC22:621.36/4 NO Includes bibliographical references and index NO 書誌ID=1000076768; NCID=BA76429737; LK [OPAC]https://libop-nifs.nifs.ac.jp/opac/opac_link/bibid/1000076768 LK [Webcat Plus]http://webcatplus-equal.nii.ac.jp/libportal/DocDetail?hdn_if_lang=jpn&txt_docid=NCID:BA76429737; [Webcat Plus]http://webcatplus-equal.nii.ac.jp/libportal/EqualFromForm?txt_isbn=0819458457 OL 30