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RT Book, Whole SR Print DC OPAC T1 Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions / edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood T2 Materials science and process technology series A1 Rossnagel, Stephen M. A1 Cuomo, J. J. A1 Westwood, William D. (William Dickson), 1937- YR 1990 FD c1990 SP xxiii, 523 p. K1 Plasma engineering K1 Semiconductors -- Etching K1 Plasma etching PB Noyes Publications PP Park Ridge, N.J. SN 0815512201 LA English (英語) CL LCC:TA2020 CL DC19:621.044 NO Includes bibliographical references and index NO 書誌ID=1000054330; NCID=BA18754617; LK [OPAC]https://libop-nifs.nifs.ac.jp/opac/opac_link/bibid/1000054330 LK [Webcat Plus]http://webcatplus-equal.nii.ac.jp/libportal/DocDetail?hdn_if_lang=jpn&txt_docid=NCID:BA18754617; [Webcat Plus]http://webcatplus-equal.nii.ac.jp/libportal/EqualFromForm?txt_isbn=0815512201 OL 30