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RT Book, Whole SR Print DC OPAC T1 Dry etching for microelectronics / edited by Ronald A. Powell T2 Materials processing, theory and practices A1 Powell, Ronald A. YR 1984 FD 1984 SP xi, 299 p. K1 Semiconductors -- Etching K1 Plasma etching PB North-Holland PB Distributors for the USA and Canada, Elsevier Science Pub. Co. PP Amsterdam ; Tokyo PP New York, N.Y. SN 0444869050 LA English (英語) CL LCC:TK7871.85 CL DC:621.381/73 NO Bibliography: p. 223-294 NO Includes index NO 書誌ID=1000010319; NCID=BA00157673; LK [OPAC]https://libop-nifs.nifs.ac.jp/opac/opac_link/bibid/1000010319 LK [Webcat Plus]http://webcatplus-equal.nii.ac.jp/libportal/DocDetail?hdn_if_lang=jpn&txt_docid=NCID:BA00157673; [Webcat Plus]http://webcatplus-equal.nii.ac.jp/libportal/EqualFromForm?txt_isbn=0444869050 OL 30