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Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions / edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood
(Materials science and process technology series)
| Material Type | Books |
|---|---|
| Publisher | Park Ridge, N.J. : Noyes Publications |
| Classification | LCC:TA2020 DC19:621.044 |
| Year | c1990 |
| Size | xxiii, 523 p. : ill. ; 25 cm |
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| Notes | Includes bibliographical references and index |
|---|---|
| Authors | Rossnagel, Stephen M. Cuomo, J. J. Westwood, William D. (William Dickson), 1937- |
| Subjects | LCSH:Plasma engineering LCSH:Semiconductors -- Etching All Subject Search LCSH:Plasma etching |
| ID | 1000054330 |
| NCID | BA18754617 |