<図書>
Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions / edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood
(Materials science and process technology series)
データ種別 | 図書 |
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出版者 | Park Ridge, N.J. : Noyes Publications |
分 類 | LCC:TA2020 DC19:621.044 |
出版年 | c1990 |
大きさ | xxiii, 523 p. : ill. ; 25 cm |
書誌詳細を非表示
一般注記 | Includes bibliographical references and index |
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著者標目 | Rossnagel, Stephen M. Cuomo, J. J. Westwood, William D. (William Dickson), 1937- |
件 名 | LCSH:Plasma engineering LCSH:Semiconductors -- Etching 全ての件名で検索 LCSH:Plasma etching |
書誌ID | 1000054330 |
NCID | BA18754617 |