<Books>
Applications of plasma processes to VLSI technology / edited by Takuo Sugano ; translated by Hyo-gun Kim
Material Type | Books |
---|---|
Publisher | New York : Wiley |
Classification | LCC:TK7871.85 DC19:621.381/73 |
Year | c1985 |
Size | xiv, 394 p. : ill. ; 24 cm |
Hide book details.
Hide details.
Other titles | original title:Handōtai purazuma purosesu gijutsu |
---|---|
Notes | Translation of: Handōtai purazuma purosesu gijutsu "A Wiley-Interscience publication." Bibliography: p. 369-389 Includes index |
Authors | 菅野, 卓雄(1931-) <スガノ, タクオ> |
Subjects | LCSH:Semiconductors -- Etching
All Subject Search
LCSH:Integrated circuits -- Very large scale integration -- Design and construction All Subject Search LCSH:Plasma etching LCSH:Vapor-plating |
ID | 1000011234 |
NCID | BA0724373X |